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Dark current measurement of Type-Ⅱ superlattice infrared focal plane array detector

机译:Ⅱ型超晶格红外焦平面阵列探测器的暗电流测量

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We report the result of a dark current measurement of a Type-Ⅱ superlattice (T2SL) infrared focal plane array (FPA), which consists of a 6 μm cutoff T2SL detector array and the readout integration circuit (ROIC) ISC0903 of FLIR Systems. In order to measure the dark current of the FPA, we obtained images with different exposure times in a fully closed cold shield of 77 K. Using the temporal change rate of the output and considering the charge conversion efficiency of the ROIC, we obtained a dark current density with an average value of 4 × 10~(-5) A/cm~2 at a bias of-100 mV. We also compare the result of the FPA dark current measurement with that of a test element group (TEG), which was a single pixel detector, fabricated by the same process as the FPA. The dark current density of the TEG was 3 × 10~(-6) A/cm~2 at a bias of-100 mV, lower than that of the FPA. We discuss the discrepancy between the dark current densities of the FPA and the TEG.
机译:我们报告了II型超晶格(T2SL)红外焦平面阵列(FPA)暗电流测量的结果,该阵列由一个6μm截止的T2SL检测器阵列和FLIR Systems的读出积分电路(ROIC)ISC0903组成。为了测量FPA的暗电流,我们在77 K的全封闭冷罩中获得了具有不同曝光时间的图像。使用输出的时间变化率并考虑ROIC的电荷转换效率,我们获得了暗电流。电流密度为100 mV时的平均值为4×10〜(-5)A / cm〜2的电流密度。我们还将FPA暗电流测量的结果与测试元件组(TEG)的结果进行了比较,测试元件组是一个单像素检测器,通过与FPA相同的过程制成。 TEG的暗电流密度在100 mV的偏压下为3×10〜(-6)A / cm〜2,低于FPA的暗电流密度。我们讨论了FPA和TEG的暗电流密度之间的差异。

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