首页> 外文会议>Conference on infrared technology and applications >Three-dimensional numerical simulation of planar P~+n heterojunction In_(0.53)Ga_(0.47)As photodiodes in dense arrays Part Ⅰ: Dark current dependence on device geometry
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Three-dimensional numerical simulation of planar P~+n heterojunction In_(0.53)Ga_(0.47)As photodiodes in dense arrays Part Ⅰ: Dark current dependence on device geometry

机译:密集阵列中平面P〜+ n异质结In_(0.53)Ga_(0.47)As光电二极管的三维数值模拟Ⅰ:暗电流对器件几何形状的依赖性

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Low light level imaging applications requiring high detectivity demand photon shot noise limited performance at temperatures near 300K. Analytical models, however, have provided limited insight on underlying mechanisms limiting performance in conventional planar double heterointerface In_(0.53)Ga_(0.47)As on InP P~+n photodiodes for imaging the visible and short wave infrared. Quantitative modeling provides tools to investigate performance sensitivities and their underlying mechanisms. In this work we use three-dimensional numerical simulation to investigate intrinsically limited diffusion and Shockley-Read-Hall generation recombination dark currents for a planar P~+n photodiode situated in a 3×3 mini array. We assess the influence of geometry by varying pitch, junction location, and photodiode size. Modeling shows that SRH generation currents, not including surface effects, vary with both junction perimeter and area, and that the perimeter component dominates small radius junctions. By varying the axial junction placement we show that widegap junctions result in bias-dependent quantum efficiencies that require higher reverse bias, and result in higher dark currents, than shallow homojunctions at comparable efficiencies. Finally, numerical simulation explains lateral diffusion current suppression in dense arrays in terms of suppressed minority carrier density gradients. The analysis demonstrates that the boundary condition applicable to dense arrays requires no lateral diffusion current at symmetry planes bisecting segments connecting uniformly reverse biased nearest neighbor diodes. Following Grimbergen, this leads to radial geometry curves describing dark intrinsic diffusion reductions with pitch. The quantitative modeling provides insight explaining the observation that the ideal diode equation correctly estimates dense array dark diffusion currents.
机译:需要高检测率的低光度成像应用要求光子散粒噪声在300K附近的温度下性能受到限制。然而,分析模型对于限制用于在可见光和短波红外成像上的InP P + n光电二极管上的常规平面双异质界面In_(0.53)Ga_(0.47)As的性能的潜在机理提供了有限的见识。定量建模提供了研究性能敏感性及其潜在机制的工具。在这项工作中,我们使用三维数值模拟研究位于3×3微型阵列中的平面P〜+ n光电二极管的固有受限扩散和Shockley-Read-Hall生成复合暗电流。我们通过改变间距,结位置和光电二极管尺寸来评估几何形状的影响。建模表明,不包括表面效应的SRH产生电流随结周边和面积而变化,并且周界分量主导着小半径结。通过改变轴向结的位置,我们表明,与能效相当的浅同质结相比,宽能隙结产生的偏置相关量子效率需要更高的反向偏置,并且产生更高的暗电流。最后,数值模拟从抑制少数载流子密度梯度的角度解释了密集阵列中的横向扩散电流抑制。分析表明,适用于致密阵列的边界条件不需要在对称平面上将连接均匀反向偏置的最近邻二极管的两等分线段的横向扩散电流。紧随Grimbergen之后,这将导致径向几何曲线描述黑暗的本征扩散随间距的减小。定量建模提供了见解,可以解释理想二极管方程正确估计密集阵列暗扩散电流的观察结果。

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