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Effect of the resistance of open and short faults on the production testing of MCML gates

机译:开断和短路故障的电阻对MCML闸门生产测试的影响

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This paper focuses on the production testing of MOS Current Mode Logic (MCML) gates based on 45nm MOS technology. The effect of the resistance value of open faults in an NAND/AND gate is investigated. It is shown that the test speed is determined by the characteristics of the pull up load. Open faults in other transistors are not affected by test speed. Also, it is proven that only three ordered test vectors are needed to detect all open as well as short resistive faults in the gate. Finally, the effect of the resistance of short faults is studied and it is found that the value of the resistance of the short does not affect the ability of vectors to detect faults in the 45nm technology while this is not the case for the 90nm MCML or the 45nm CMOS technologies.
机译:本文重点介绍基于45nm MOS技术的MOS电流模式逻辑(MCML)门的生产测试。研究了“与非”门与“与非”门中的断路电阻值对电阻的影响。结果表明,测试速度取决于上拉负载的特性。其他晶体管的开路故障不受测试速度的影响。此外,已证明仅需要三个有序的测试向量即可检测出栅极中的所有断路和短路电阻故障。最后,研究了短路故障电阻的影响,发现短路电阻的值不会影响矢量在45nm技术中检测故障的能力,而90nm MCML或90nm情况并非如此。 45nm CMOS技术。

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