A new approach on advanced compact plasma sensors for industrial plasma applications

摘要

A novel compact plasma sensor applicable for the supervision and control of industrial plasma processes is presented in this contribution. Based on the multipole resonance probe (MRP), the new planar multipole resonance probe (pMRP) flush-mounted into the reactor wall can be used for an effective suppression of disruptions on the plasma process itself. Using 3D-electromagnetic field simulations, the MRP and the pMRP are investigated and compared. Furthermore, limitations concerning position tolerances are shown and the suitability is demonstrated.