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The Effect of Ⅳ Characteristics on Optical Control of SDR Si IMPATT Diode

机译:Ⅳ特性对SDS SI Impatt二极管光学控制的影响

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Effect of light incident on the Si SDR IMPATT diode is investigated in this paper. The authors have used an IMPATT diode which is consists of p+, n+ (contact region), n-well region and p-sub region. Since the n-well region is used to be the drift region of the structure, the light is shined on the top of the layer through tiny hole created on the SiO_2 layer. The results of the Ⅳ characteristics are compared to the dark current condition which no light will be supply on top of the structure. The result of the electric field and mobility in those two conditions are also observed in this paper.
机译:本文研究了光线入射对Si SDS灭绝二极管的影响。作者使用了由P +,N +(接触区域),N阱区和P子区域组成的灭码二极管。由于N阱区用于结构的漂移区域,因此光通过在SiO_2层上产生的微小孔在层的顶部上闪闪发光。 ⅳ特性的结果与暗电流条件进行比较,在结构的顶部没有光线供应。在本文中还观察到电场和迁移率的结果。

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