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Super Capacitance Properties of SnO_2 Coated Nickel/Silicon MicroChannel Plates

机译:SnO_2涂层镍/硅微通道板的超电容性能

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Supercapacitor is achieved by combining tin oxide with three dimensional silicon microchannel plates (Si-MCPs) deposited with nickel film. Electrodeposition is applied to deposit the tin oxide on the Ni/Si-MCPs structure followed by sintering at 450°C. The structure and morphology of the samples are characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The electrochemical properties are investigated in 1 M Na_2SO_4 solution by cyclic voltammetry, galvanostatic charging-discharging, and electrochemical impedance spectroscopy. The highest specific capacitance of 0.814 F/cm~2 (171.37 F/g) is achieved from the sample deposited for 2 h followed by sintering for 2 h.
机译:超级电容器是通过将氧化锡与沉积有镍膜的三维硅微通道板(Si-MCP)结合在一起而获得的。进行电沉积以将氧化锡沉积在Ni / Si-MCPs结构上,然后在450°C下烧结。样品的结构和形态通过X射线衍射(XRD)和扫描电子显微镜(SEM)进行表征。通过循环伏安法,恒电流充放电和电化学阻抗谱研究了在1 M Na_2SO_4溶液中的电化学性能。从沉积2小时的样品中获得最高比电容为0.814 F / cm〜2(171.37 F / g),然后烧结2 h。

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