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Modeling Graphene FET Frequency Doubler With Integrated Quantum Capacitance Effects Using Quartic Equation Technique

机译:使用四静学方程技术建模石墨烯FET频率倍增器

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The need for placing more number of transistors in the core area by shrinking of electronic devices has brought out the necessity of scaling down the Field Effect Transistor (FET) devices. According to the current equation of existing MOSFET device the parameters which can increase the device current is probably channel width and the mobility of electrons and holes. The parameter which can help in improving the device performance will be the mobility of electrons and holes. Hence the necessity of replacing the channel material has become a leading research work in nano electronics. The allotrope of carbon atom - Graphene has the most required mobility range which can help in scaling down the currently available MOSFET devices. Some of the parameters which can be improved due to the replacement of channel material is the device drain current, reduction in the amount of impurity added to obtain the required drain current. A scaled down 15nm Dual Gate Graphene Field Effect Transistor is modeled in this work. As the device is scaled down to a such a narrow range the necessity of investigating the device parameters in a nano scale has been carried out using a novel approach of segmenting the channel. An additional focus in this paper is to employ a computationally efficient method for including the Quantum Capacitance effect. The most common methodology for obtaining the values for quantum capacitance is through solving the equations simultaneously as proposed in [1],[2]. The parameters of interest like quantum capacitance and channel potential are assumed initially and the equations are solved until the assumed parameter value and the obtained value are equal. This not only increases the simulation time but also ends up in approximate result values which are complex. The complex solutions cannot be separated into a real and imaginary value in verilog-a as well as in verilog-ams language as given in [3],[4], to enable circuit compatibility. Moreover the approximate results obtained through the existing methodologies are of huge margin for a 15nm scaled down device. This makes it difficult to implement dual gate GFET in cadence - virtuoso environment. Hence the only way to implement the equations in a circuit level of simulation is to bring out the results as real value and not a complex number. In order to avoid complex solutions the only way is to convert the equations into a polynomial. Hence a novel method which uses a fourth order polynomial known as quartic equation in which the quantum capacitance is derived from the channel potential equation is proposed. The methodology adopted in this work is quartic equation whose results are real valued solutions and hence overcomes the complex number solutions obtained so far. This makes it possible for the model to be developed in verilog-a and incorporated as circuit model. The proposed fourth order polynomial equation can be used to calculate quantum capacitance for any device which obeys the ballistic transport. Hence the device structure proposed in this work is limited to ballistic structure. Ballistic transport of electrons can be obtained when the length and width of the channel is lesser than the mean free path. A N-type impurity of about 2.63*10~(11)cm~(-2) (calculated, not presented here) is added in order to achieve a mobility of 2497 cm/Vs. Impurities can be further added but it will lead to increased scattering of electrons which will affect the ballistic structure. Hence further addition of impurity to enhance the mobility is stopped. In this model the carriers' Fermi velocity of 10~6 m/s, tox of 1.5nm (top and bottom), length (L) of 15nm, a width (W) of 150 nm, C_(ox)(bottom gate) of 23.024×10~(-3) F/m are used and the determined value of mobility is found to be better as reported in Table 1. The methodology adopted as above resulted in lower channel potential drop due to reduced scattering. This has brought down lower quantum capacitance values when compared to the exis
机译:通过收缩电子器件将更多数量的晶体管放置在芯区域中,已经提出了缩小场效应晶体管(FET)器件的必要性。根据现有MOSFET器件的当前方程,可以增加器件电流的参数可能是频道宽度和电子和孔的移动性。可以帮助改善设备性能的参数是电子和孔的移动性。因此,更换渠道材料的必要性已成为纳米电子的主要研究工作。碳原子 - 石墨烯的同位素具有最需要的移动范围,可以帮助缩小当前可用的MOSFET器件。由于置换通道材料而可以改善的一些参数是器件漏极电流,减少加入的杂质量以获得所需的漏极电流。缩放15nm双栅极石墨烯场效应晶体管在这项工作中建模。当设备被缩小到这样的窄范围时,使用新的分割通道的新方法来执行在纳米尺度中调查纳米级参数的必要性。本文的另一个焦点是采用计算上有效的方法,用于包括量子电容效应。用于获得量子电容值的最常见方法是通过在[1],[2]中提出的同时求解方程。假设最初假设价感的参数,如量子电容和信道电位,并且求解方程,直到假定的参数值和所获得的值相等。这不仅增加了模拟时间,而且最终在复杂的近似结果值中最终。复杂的解决方案不能分成Verilog-A以及在[3],[4]中给出的Verilog-AMS语言中的真实和虚数值,以实现电路兼容性。此外,通过现有方法获得的近似结果对于15nm缩小的设备,通过现有方法获得的巨大边距。这使得难以在Cadence中实现双栅GFET - Virtuoso环境。因此,在电路模拟电路级别实现方程的唯一方法是将结果作为实际值呈现,而不是复数。为了避免复杂的解决方案,唯一的方法是将方程转换为多项式。因此,提出了一种新的方法,其使用称为四阶多项式的四阶多项式,其中距离信道电位方程来推导量子电容。本作工作采用的方法是四个方程,其结果是真实的值解决方案,因此克服了到目前为止所获得的复数溶液。这使得该模型可以在Verilog-A中开发并作为电路模型结合。所提出的四阶多项式方程可用于计算任何携带弹道传输的设备的量子电容。因此,该工作中提出的器件结构仅限于弹道结构。当通道的长度和宽度小于平均自由路径时,可以获得电子的弹道传输。添加约2.63×10〜(11)cm〜(-2)的n型杂质(此处不呈现)以实现2497cm / vs的迁移率。可以进一步添加杂质,但它会导致电子的散射,这将影响弹道结构。因此,停止进一步加入杂质以增强迁移率。在该模型中,载流子速度为10〜6米/秒,Tox为1.5nm(顶部和底部),长度(l)为15nm,宽度(w),150nm,c_(ox)(底栅)使用23.024×10〜(-3)f / m,发现所确定的迁移率值更好,如表1所示。如上所述所采用的方法导致由于降低散射而导致较低的通道电位下降。与EXIS相比,这使得较低量子电容值下降

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