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Electroless nickel/Immersion gold process on Aluminum alloy electrodes

机译:铝合金电极上的化学镀镍/浸泡金工艺

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摘要

Electronic equipment has changed to have higher performance with minimized in size. This trend required to electronic devices minimization also. Numerous packaging techniques have developed using metal flame, PWB material and plastic tape to mount semiconductor devices on PWB1). To achieve further high mounting density, the semiconductor device directly solder mounted on package after forming metal bumps on electrode of semiconductor devices. Aluminum alloy is common material for electrode of semiconductor devices, since it has relatively high conductivity, chemically stable and less reaction in semiconductor manufacturing process. However, it needs other meal layer for soldering to form bump on it. Sputtered Ti/Cu layer and electrolytic solder plating is widely used to form solder bump. However, this process requires longer and costly process such as multiple vacuum process, photo image process, etc.
机译:电子设备已经改变为具有更高的性能,大小最小化。电子设备最小化所需的这种趋势也是如此。许多包装技术采用金属火焰,PWB材料和塑料胶带开发,以安装PWB 1的半导体器件)。为了实现进一步的高安装密度,在半导体器件的电极上形成金属凸块之后,半导体器件直接安装在封装上。铝合金是半导体器件的电极的常见材料,因为它具有相对高的导电性,在半导体制造过程中的反应性相对高。然而,它需要其他焊接层来焊接形成凹凸。溅射的Ti / Cu层和电解焊接电镀广泛用于形成焊料凸块。但是,该过程需要更长且昂贵的过程,例如多个真空过程,照片图像处理等。

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