Equivalent Electrical Model and Experimental Analysis of a Novel Needle-ring Atmospheric Pressure Plasma Microjets Array

摘要

We present a novel atmospheric pressure plasma microjets (APPµJ) array to achieve the localized mask-free parallel processing for material. Benefited from ease and low-cost microfabrication technology, the dimension and distance of adjacent jets can be designed at micro/nano scale. The equivalent electrical model of APPµJ is developed to investigate discharge electrical mechanism of plasma microjets. The simulation results show that the discharge is in Dielectric Barrier Discharge (DBD) mode, which has good consistency with experiment measurement. In addition, we use APPµJ array to realize maskless localized parallel etching of graphene film, and the results exhibit good surface quality and uniformity.