High-numerical-aperture focused field measurement system based on a confocal microscopy

摘要

A high-numerical-aperture (NA) focused field measurement system based on a confocal microscopy is presented, and its basic structure and operation theory are introduced in details. In order to evaluate the reliability and efficiency of the measurement system, the focused field intensity distributions of several types of beams, including linearly polarized beams, radially polarized beams, azimuthally polarized beams and radially polarized vortex beams are measured while the NA of the focused objective lens is 0.90, and the Measured results agree with the calculated results. In addition, some methods are also proposed to improve the measurement accuracy at last.