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Analytical description of band gaps in a ternary metallo-dielectric stack

机译:三元金属电介质堆叠中带隙的分析描述

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Metallo Dielectric Photonic Crystals formed by same periodicity metallic inserts in a Dielectric Photonic Crystal show tliree kind of band gaps, those at the well know dielectric band gap, the ones attributed to the absorption of metal to low frequencies and a new class of metallic bandgaps. Numerical studies have confirmed that while the dielectric band gap width is basically described by the refraction index contrast, the width of the metallic band is described by the thickness of the metal inserts. In this work we carry on the corresponding analytical analysis of both band gaps for this one dimensional ternary dielectric-dielectric-metal structure. The stack that we are proposing is a quarter-wave for the dielectrics and the thickness of the metallic layers is changed as a free parameter. Using standard transfer matrix formalism, we find a closed form of the dispersion relation and from it; we have analytically demonstrated the formation and width of the dielectric band gap and its metallic perturbation, as well as those of the additional metallic band gap.
机译:由介电光子晶体中相同周期的金属插入物形成的金属介电光子晶体显示出第三种带隙,那些处于众所周知的介电带隙,归因于低频吸收金属和新型金属带隙。数值研究已经证实,虽然介电带隙宽度基本上由折射率对比来描述,但是金属带的宽度却由金属插入物的厚度来描述。在这项工作中,我们对该一维三元介电-介电-金属结构的两个带隙进行了相应的分析。我们建议的堆栈是电介质的四分之一波长,金属层的厚度作为自由参数进行了更改。使用标准的传递矩阵形式主义,我们找到了色散关系的封闭形式,并由此得出。我们已经分析地证明了介电带隙的形成和宽度及其金属扰动,以及其他金属带隙的形成和宽度。

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