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ATOMIC LAYER DEPOSITION OF ZnInXSY BUFFER LAYERS FOR COPPER INDIUM GALLIUM DISELENIDE THIN FILM SOLAR CELLS

机译:铜铟二硒化镓薄膜太阳能电池ZnInXSY缓冲层的原子层沉积

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We report in this paper the study of ZnIn_XS_Y films deposited by atomic layer deposition at 200 °Cfor buffer layers in CIGS solar cells. The growth was monitored at the atomic layer level by in situ quartz crystalmicrobalance technique. Buffer layers with different In/(In+Zn) ratios over the whole composition range wereprepared and characterized. Cell results show that an intermediate composition allows to find a compromisebetween the properties of In_2S_3 and ZnS as aimed for this study. Best efficiencies were obtained with indium richbuffer layers but with limited V_(oc) and light losses due to absorption in the short wavelengths. At the opposite,zinc rich buffer layers are more transparent and may allow higher V_(oc) and Jsc but increase interfacerecombination. In particular, the layer with In/(In+Zn) = 28 % led to a V_(oc) 30 mV higher than using a referenceCdS buffer layer and an equivalent Jsc but a decreased fill factor.
机译:我们在本文中报告了在200°C下通过原子层沉积法沉积ZnIn_XS_Y膜的研究 用于CIGS太阳能电池的缓冲层。用原位石英晶体在原子层水平监测生长 微量天平技术。在整个组成范围内,具有不同In /(In + Zn)比的缓冲层为 准备和表征。单元格结果显示,中间成分可以找到折衷方案 本研究旨在确定In_2S_3和ZnS的性质之间的关系。富铟可获得最佳效率 缓冲层,但是由于短波长的吸收而具有有限的V_(oc)和光损耗。在对面, 富锌缓冲层更透明,可以允许更高的V_(oc)和Jsc,但增加了界面 重组。特别是,In /(In + Zn)= 28%的层导致的V_(oc)比参考电压高30 mV CdS缓冲层和等效的Jsc,但填充因子降低。

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