Photo-patternable Silicon-Organic Hybrid Glass with Silsesquioxane derivatives

摘要

We succeeded in development of photo-patternable Silicon-Organic Hybrid Glass with siloxane derivatives comprised of silsesquoxanes incorporated with silica unit synthesized by acid and base catalyst. The cured film has high optical transparency, thermal stability and chemical durability together with excellent photolithographic property. Here we present role of organic function for silsesquioxane and importance of synthetic catalyst on photolithographic property. We also demonstrate successful usage of photo-patternable silicon-organic hybrid glass materials and lithography patterning.