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HRC? REMEDIATION OF PCE AT A NEW JERSEY, PRINTED CIRCUITS SITE

机译:HRC?在新印刷厂印刷电路板上修复PCE

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Spilled perchloroethene (PCE), at a former printed circuits manufacturing facility in New Jersey had migrated through the saturated overburden and into fractured bedrock. Upward vertical flow within the aquifer mitigated the depth of migration, and PCE was delimited to the saturated overburden and shallow bedrock. Ground water monitoring over the ensuing 15-year period consistently measured PCE concentrations up to 80,000 μg/L, and PCE represented more than 80 percent of the total VOC mass. Hydrogen Release Compound (HRC?) was injected during September/October 2001 and approximately 16,000 pounds of HRC? were injected into 200 well points using a combination of direct-push and air rotary equipment with inflatable packers. Monitoring in the first year after injection demonstrated dramatic improvements in the core of the treatment area. Post-injection PCE concentrations declined to less than 10 percent of the total VOC mass and 1,2-DCE increased to approximately 85 percent of the VOC mass with significant increases in vinyl chloride concentrations. PCE concentrations at the fringe of the treatment area exhibit PCE reductions of more than 50 percent. Targeted reinjection of HRC? and attenuation monitoring are planned and overall, HRC? has significantly influenced geochemical conditions to promote in situ dechlorination. The net outcome has been dramatically improved ground water quality and a high probability that the site will be suitable for no further remedial action within a 3 to 5 year timeframe.
机译:泄漏的全氯乙烯(PCE),在新泽西州的一家以前的印刷电路制造厂,已经迁移穿过饱和的覆盖层,并进入了破裂的基岩中。含水层内向上的垂直流动减轻了迁移的深度,而PCE被界定为饱和的上覆岩层和浅基岩。在随后的15年中,对地下水进行的监测始终测量出高达80,000μg/ L的PCE浓度,而PCE占总VOC质量的80%以上。在2001年9月/ 10月注入了氢释放化合物(HRC2)和大约16,000磅的HRC2。使用直接推动和气动旋转设备以及可充气封隔器的组合,将其注入200个井点。注射后第一年的监测表明,治疗区域的核心得到了显着改善。注射后PCE浓度下降到总VOC质量的不到10%,1,2-DCE上升到VOC质量的约85%,其中氯乙烯的浓度显着增加。在治疗区域边缘的PCE浓度显示PCE降低超过50%。有针对性地注射HRC? HRC是否已计划和全面进行衰减监控?显着影响了地球化学条件以促进原位脱氯。最终结果是显着改善了地下水水质,极有可能在3至5年内不采取进一步补救措施。

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