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New Measuring Scale of CMMs

机译:三坐标测量机的新测量规模

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摘要

In order to get high precision, low-cost and high anti-interfere performance measuring scale of CMMs, this paper, on the basis of metrological grating, introduces the metrological grating with nano measurement precision, which is based on two times Moire fringe. The basic principle is that two indicated gratings, which are fixed on the same measuring base scale, move relatively to the scale grating thus produce two groups of one time Moire fringes, two groups of lens are used to adjust the moving direction of the two groups of the one time Moire fringe to be opposite, therefore the two groups of one time Moire fringes interfere with each other and produce two times Moire fringe. By subdivision of the two times Moire fringe and through simulation calculation the resolution of the grating can achieve 5.40 x 10~(-10)m, and the measurement precision can achieve nanometer. Besides, this paper analyses the grating's principle error, the grating scribing error, the light source error and the adjusting error of optical system, and discusses the methods of compensation and correction of these errors.
机译:为了获得三坐标测量机的高精度,低成本和高抗干扰性能的测量尺度,本文在计量光栅的基础上,介绍了基于二次莫尔条纹的纳米测量精度的计量光栅。基本原理是,将两个指示的光栅固定在相同的测量基准刻度上,它们相对于刻度光栅相对移动,从而产生两组一次的莫尔条纹,两组透镜用于调节两组的移动方向一次莫尔条纹的对立,因此两组一次莫尔条纹相互干扰并产生两次莫尔条纹。通过将两个莫尔条纹进行细分并通过模拟计算,光栅的分辨率可以达到5.40 x 10〜(-10)m,测量精度可以达到纳米。此外,本文分析了光栅的原理误差,光栅刻划误差,光源误差和光学系统的调整误差,并讨论了补偿和校正这些误差的方法。

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