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KeV x-ray source toward 100 fs time-resolved X-ray applications

机译:KeV X射线源朝向100 fs时间分辨X射线应用

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Optical pump, x-ray diffraction probe experiments have been used to study the lattice dynamics of organic materials using a laser-produced plasma x-ray source. The plasma x-ray source is generated from a 10 Hz, 26 mJ, 120 fs laser beam focused on a silicon wafer target. The emitted K_α x-ray radiation is used to probe samples optically perturbed at laser fluences from 1.8 J/cm~2 to 27 J/cm~2. Ultrafast disordering inside the lattice - within a time scale below 600 fs to few tens of picoseconds - is clearly observed and produce a drop of the probe x-ray diffracted signal.
机译:已经使用光泵,X射线衍射探针实验来研究使用激光产生的等离子体X射线源的有机材料的晶格动力学。等离子体X射线源由聚焦在硅晶片靶上的10 Hz,26 mJ,120 fs激光束产生。发出的K_αx射线辐射用于探测在1.8 J / cm〜2到27 J / cm〜2的激光注量下受到光学扰动的样品。在低于600 fs到几十皮秒的时间范围内,可以清楚地观察到晶格内部的超快无序现象,并会产生探针X射线衍射信号的下降。

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