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A Novel Microwave Source for the Deposition of Protective, Tribological and Decorative Coatings: Plasma Characterization and Applications

机译:一种新型微波源,用于保护防护,摩擦学和装饰涂料:血浆表征和应用

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The KIT designed a novel MW source with a parabolic reflector to focus the high microwave plasma density directly onto the substrates during the deposition of scratch, corrosion and wear protective, tribological, biocompatible and decorative coatings by a PECVD processes using e.g. siloxane and hydrocarbons as precursor compounds. A number of MW sources can be arranged in line or even lateral to form a larger coating area to be used in Inline coaters or lager batch coating systems, also being easily combined with other PVD sources e.g. planar and rotatable sputter magnetrons, both with the option to be driven with a HiPIMS generator to create new and promising combinations of diverse plasma effects. At the very first it is necessary to characterize the plasma by different diagnostic methods, e.g. Langmuir probe measurements, OES, RFA and others, but also work out the influence of the plasma parameter settings for the properties of the deposited layers, e.g. DLC- or quartz-like-coatings. At least the design has to be optimized in detail to ensure a long-lasting reliable stability of process conditions and product properties in industrial production. First results for all issues will be presented.
机译:该试剂盒设计了一种具有抛物面反射器的新型MW源,在划伤,腐蚀和耐磨保护,摩擦学,生物相容和装饰性涂层中,使用例如使用例如使用例如PECVD方法,将高微波等离子体密度直接聚焦到基板上。硅氧烷和碳氢化合物作为前体化合物。许多MW源可以排列或甚至横向以形成较大的涂布区域,以便在内联涂层或贮存批涂层系统中使用,也可以容易地与其他PVD源组合。平面和可旋转的溅射磁控磁控管,都可以通过HIPIMS发生器驱动,以创造新的和有前途的不同等离子体效果的组合。首先,需要通过不同的诊断方法表征等离子体,例如, Langmuir探测测量,OES,RFA等,还可以解决沉积层的性质的等离子体参数设置的影响,例如, DLC-或石英样涂层。至少必须详细优化设计,以确保工业生产中的工艺条件和产品性能的长期可靠稳定性。将提出所有问题的第一个结果。

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