首页> 外文会议>IEEE world conference on photovoltaic energy conversion;WCPEC;IEEE photovoltaic specialists conference;PVSC >GROWTH OF EPITAXIAL CdTe/CdS HETEROSTRUCTURES FOR SINGLE CRYSTAL THIN FILM SOLAR CELL APPLICATIONS
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GROWTH OF EPITAXIAL CdTe/CdS HETEROSTRUCTURES FOR SINGLE CRYSTAL THIN FILM SOLAR CELL APPLICATIONS

机译:单晶薄膜太阳电池应用中外延CdTe / CdS异质结构的增长

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Epitaxial CdTe/CdS heterostructures have been grown by molecular beam epitaxy onto BaF_2 covered Si (111) substrates. An epitaxial BaF_2 buffer is used for compatibility reasons, and because of easier dissolution during the lift-off processing. Epitaxy of cubic CdS (111) layers on BaF_2/Si (111) is achieved; electron channelling patterns exhibit a three-fold symmetry which is a characteristic for cubic crystal structures. The growth kinetics and structural properties of epitaxial CdS and CdTe/CdS have been studied with reflection high energy electron diffraction, Rutherford backscattering spectrometry and x-ray diffraction rocking curve measurements. The full width at half maximum of the (222) CdS and (333) CdTe x-ray peaks are ~1150 arcsec for 2.7 and 3.4 μm thick CdS and CdTe layers, respectively. To fabricate CdTe/CdS single crystal thin film solar cells, a lift-off process has been developed to remove the epitaxial layers from the Si substrates.
机译:外延CdTe / CdS异质结构已通过分子束外延生长到BaF_2覆盖的Si(111)衬底上。出于兼容性原因,以及在提离过程中更容易溶解,使用外延BaF_2缓冲液。实现了BaF_2 / Si(111)上立方CdS(111)层的外延;电子沟道图形表现出三重对称性,这是立方晶体结构的特征。通过反射高能电子衍射,卢瑟福背散射光谱和X射线衍射摇摆曲线测量研究了外延CdS和CdTe / CdS的生长动力学和结构特性。对于2.7和3.4μm厚的CdS和CdTe层,(222)CdS和(333)CdTe x射线峰的半峰全宽分别约为〜1150 arcsec。为了制造CdTe / CdS单晶薄膜太阳能电池,已经开发了剥离工艺以从Si衬底去除外延层。

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