Novel negative resists using thermally stable crosslinkers based on phenolic compounds

摘要

Abstract: This is a preliminary report on a family of crosslinkers based on phenolic compounds for negative-working photoresists which are suitable for KrF excimer laser exposure using poly(hydroxystyrene) (PHS) as a base resin. The crosslinkers are benzylic derivatives having etherificated or esterificated phenolic hydroxyl group. Several effects upon the resist performances of chemically amplified (CA) resist systems comprising onium salt, PHS, and the crosslinkers are mainly discussed: i.e., sort of substituent, sort of mother molecular structure, sort of crosslinkable group, baking conditions, PHS's molecular weight, additives, and so on. The CA resist gives quarter-micron line and space pairs without swelling using a KrF excimer laser exposure. Moreover, in this report another effective method for inhibiting the swelling is proposed. Finally, a unique negative resist, which is not a CA resist, is also presented. It gives negative-tone images by thermal crosslinking reaction following photo-induced dissociation of the protective group of crosslinker. !13