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Bulk damage and absorption in fused silica due to high-power laser applications

机译:由于大功率激光应用,熔融二氧化硅的散装损坏和吸收

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Laser fusion projects are heading for IR optics with high broadband transmission, high shock and temperature resistance, long laser durability, and best purity. For this application, fused silica is an excellent choice. The energy density threshold on IR laser optics is mainly influenced by the purity and homogeneity of the fused silica. The absorption behavior regarding the hydroxyl content was studied for various synthetic fused silica grades. The main absorption influenced by OH vibrational excitation leads to different IR attenuations for OH-rich and low-OH fused silica. Industrial laser systems aim for the maximum energy extraction possible. Heraeus Quarzglas developed an Yb-doped fused silica fiber to support this growing market. But the performance of laser welding and cutting systems is fundamentally limited by beam quality and stability of focus. Since absorption in the optical components of optical systems has a detrimental effect on the laser focus shift, the beam energy loss and the resulting heating has to be minimized both in the bulk materials and at the coated surfaces. In collaboration with a laser research institute, an optical finisher and end users, photo thermal absorption measurements on coated samples of different fused silica grades were performed to investigate the influence of basic material properties on the absorption level. High purity, synthetic fused silica is as well the material of choice for optical components designed for DUV applications (wavelength range 160 nm - 260 run). For higher light intensities, e.g. provided by Excimer lasers, UV photons may generate defect centers that effect the optical properties during usage, resulting in an aging of the optical components (UV radiation damage). Powerful Excimer lasers require optical materials that can withstand photon energy close to the band gap and the high intensity of the short pulse length. The UV transmission loss is restricted to the DUV wavelength range below 300 nm and consists of three different absorption bands centered at 165 nm (peroxy radicals), 215 nm (E'-center), and 265 nm (non-bridging oxygen hole center (NBOH)), which change the transmission behavior of material.
机译:激光融合项目是用于IR光学元件,具有高宽带传输,高冲击和耐温性,激光耐用性,以及最佳纯度。对于此申请,熔融二氧化硅是一个绝佳的选择。 IR激光光学元件上的能量密度阈值主要受熔融二氧化硅的纯度和均匀性的影响。研究了各种合成熔融二氧化硅等级的对羟基含量的吸收行为。受OH振动激发影响的主要吸收导致OH富含和低熔融二氧化硅的不同IR衰减。工业激光系统旨在实现最大的能量提取。 Heraeus Quarzglas开发了一种YB掺杂的熔融石英纤维,以支持这一增长的市场。但是激光焊接和切割系统的性能基本上受光束质量和焦点稳定性的限制。由于光学系统的光学部件中的吸收对激光聚焦移位具有有害影响,因此必须在散装材料和涂覆的表面上最小化光束能量损失和所得加热。在与激光研究所的合作,进行光学整理器和最终用户,进行不同熔融二氧化硅等级的涂覆样品的光热吸收测量,以研究基本材料特性对吸收水平的影响。高纯度,合成熔融二氧化硅也是为DUV应用设计的光学组件的首选材料(波长范围160nm-260运行)。例如,对于更高的光强度,例如由准分子激光器提供,UV光子可以产生在使用期间实现光学性质的缺陷中心,导致光学部件的老化(UV辐射损坏)。强大的准分子激光器需要能够承受靠近带隙的光子能量的光学材料和短脉冲长度的高强度。 UV传输损耗仅限于低于300nm的DuV波长范围,并且由以165nm(过氧基团),215nm(E'-Center)和265nm(非桥接氧气孔中心)为中心的三种不同的吸收带组成。( NBOH)),改变了材料的传输行为。

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