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A Study of DQE Dependence with Beam Quality, GE Senographe Essential Detector for Mammography

机译:DQE与光束质量的相关性研究,GE Senographe乳腺摄影必不可少的检测器

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This paper deals with the analysis of objective image quality parameters for the new GE Senographe Essential FFDM system at several beam qualities. The detector consists of an indirect conversion a-Si flat panel coupled to a CsI:Tl scintillator. The system under study has gone through a series of relevant modifications in flat-panel with respect to the previous model (GE Senographe DS 2000). These changes modify its performance and are intended to favor advanced low dose applications like tomosynthesis, which uses harder beam spectra and lower doses per exposure than conventional FFDM. Although our system does not have tomosynthesis implemented, we have determined that most clinical explorations are performed by automatically selecting a Rh/Rh anode/filter combination at kV values within the range from 28 to 30 kV, which means a harder spectrum than that of typical use in FFDM. Flat-panel optimization for tomosynthesis has a clear influence in usual FFDM clinical performance and the new detector behavior needs to be investigated. Our study was extended to several beam qualities, namely, Mo/Mo and Mo/Rh at 28 kV and Rh/Rh at 26, 28, 30, and 34 kV. We found that flat-panel optimization results in higher DQE values as beam quality increases, which is contrary to the expected behavior. This positive correlation between beam quality and DQE is also diametrically opposite to that of the previous model. As a direct consequence, usual FFDM takes advantage of the changes in the detector, as less exposure is needed to achieve the same DQE if harder beams are used.
机译:本文分析了新的GE Senographe Essential FFDM系统在几种光束质量下的客观图像质量参数。该检测器由与CsI:Tl闪烁体耦合的间接转换a-Si平板组成。与以前的模型(GE Senographe DS 2000)相比,正在研究的系统在平板上进行了一系列相关的修改。这些变化改变了它的性能,旨在支持先进的低剂量应用,例如断层合成,与常规FFDM相比,它使用更硬的光束光谱和更低的每次曝光剂量。尽管我们的系统没有实施断层合成,但我们已经确定大多数临床探索是通过在kV值在28至30 kV范围内自动选择Rh / Rh阳极/过滤器组合来进行的,这意味着比常规光谱更坚硬在FFDM中使用。层析合成的平板优化对通常的FFDM临床性能有明显影响,因此需要研究新的检测器性能。我们的研究扩展到多种光束质量,即28 kV时的Mo / Mo和Mo / Rh以及26、28、30和34 kV时的Rh / Rh。我们发现,随着光束质量的提高,平板优化会导致更高的DQE值,这与预期的行为相反。光束质量和DQE之间的这种正相关也与先前模型完全相反。直接的结果是,通常的FFDM利用了检测器的变化,因为如果使用较硬的光束,则需要更少的曝光即可达到相同的DQE。

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