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Modeling disappearance of ethylene from controlled storage atmospheres exposed to ultraviolet radiation

机译:模拟暴露于紫外线的受控储存气氛中乙烯的消失

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A model describing processes causing destruction of ethylene in an atmosphere used for CA storage of apples and exposed to UV radiation has been developed. The model was based on measured emission spectra of radiation from a low pressure mercury UV germicidal lamp, and the absorption spectra of the chemical species present. A set of photochemical and chemical reactions for the static model was determined and described mathematically by the kinetics rate equations in differential form. The equations were implemented on a Fortran computer program for numerical integration.
机译:已开发出一种模型,该模型描述了在用于苹果的CA储存并暴露于UV辐射的气氛中导致乙烯破坏的过程。该模型基于低压汞紫外线杀菌灯的辐射发射光谱以及存在的化学物质的吸收光谱。确定了一组静态模型的光化学和化学反应,并通过动力学速率方程以微分形式对其进行了数学描述。这些方程在Fortran计算机程序上进行了数值积分。

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