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Giant magnetoresistnace in magnetic multilayer Co/Cu system irradiated with 23 MeV proton

机译:磁性多层Co / Cu系统中的23 MeV质子辐照的巨磁电阻

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The magnetic multilayer Co/Cu system composed of alternate thin layers of Cu and Co is prepared on Si wafer by molecular beam epitaxy (MBE) technique. The layer thickness is varied from 100 A to 1000 A. The deposition parameters like the rate of deposition, substrate temperature and the level of vacuum are standardized in order to prepare high quality epitaxial films. The degree of epitaxy is studied by the reflection high energy electron diffraction (RHEED) patterns. The films are subsequently irradiated with high energy (28 Mev) proton beams having different fluences (10~(12)-10~(14) ions/cm~2) which lead to the development of lattice defects. The role of such defects in modulating the interlayer magnetic exchange interaction, magnetocrystalline anisotropy and the magnetoresistance in such multilayer system is studied. From the observed patterns of variation in the saturation magnetization M_s and the corresponding field H_s with the layer thickness we have calculated the magnetic hysteresis curve and M-axis we have calculated the magnetic anisotropy energy K_u. By plotting K_u(d_(Co)+d_(Cu))vs. d_(Co)(where 'd' is thickness of a layer) we could calculate the bulk and interface anisotropy K_v and K_s. The variation in these parameters with the radiation fluence is noted which helps in quantitatively estimating the extent of defects in the bulk and the interface region. Interestingly, even though the saturation magnetization M_s is dropped due to irradiation, the corresponding field and the coercive field have improved which are significant from the point of view of application of these multilayers as magnetic sensors. These observations highlight that it is possible to suitably modify the extent of radiation defects in order to improve the magnetoresistivity as well.
机译:通过分子束外延(MBE)技术在Si晶片上制备了由Cu和Co的交替薄层组成的磁性多层Co / Cu系统。层厚度从100 A到1000 A不等。为了制备高质量的外延膜,对沉积参数(如沉积速率,基板温度和真空度)进行了标准化。通过反射高能电子衍射(RHEED)模式研究外延程度。随后用具有不同能量密度(10〜(12)-10〜(14)离子/ cm〜2)的高能(28 Mev)质子束照射薄膜,这导致了晶格缺陷的发展。研究了这种缺陷在调节多层系统中层间磁交换相互作用,磁晶各向异性和磁阻中的作用。根据观察到的饱和磁化强度M_s和具有层厚度的相应磁场H_s的变化模式,我们计算出磁滞曲线,而M轴计算出磁各向异性能K_u。通过绘制K_u(d_(Co)+ d_(Cu))vs。 d_(Co)(其中“ d”是层的厚度),我们可以计算体积和界面各向异性K_v和K_s。注意到这些参数随辐射通量的变化,这有助于定量估计本体和界面区域中的缺陷程度。有趣的是,即使由于照射而使饱和磁化强度M_s下降,从将这些多层用作磁传感器的观点出发,相应的磁场和矫顽磁场也得到了改善。这些观察结果表明,可以适当地改变辐射缺陷的程度,以便也改善磁阻。

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