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Field emission properties of ultra-high density vertical aligned silicon nanowires

机译:超高密度垂直取向硅纳米线的场发射特性

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The results of the investigation on the field electron emission properties of silicon nanowires (SiNWs) are reported. The measurements were carried out in an ultra-high vacuum (/spl sim/10-9Torr) system. It was revealed that the SiNW arrays have a low threshold field of 0.3 MV/m for electron emission and a high emission current density, i.e., 3.5 A/cm/sup 2/ at the applied field of /spl sim/15 MV/m. It is proposed that the high aspect ratio and the high density of the wires should be the main advantages accounting for the excellent emission properties. These findings indicate that vertical aligned SiNW have a potential in cold cathode applications.
机译:报道了对硅纳米线(SiNWs)的场电子发射特性的研究结果。测量是在超高真空(/ spl sim / 10-9Torr)系统中进行的。揭示了SiNW阵列在/ spl sim / 15 MV / m的施加场下具有用于电子发射的0.3 MV / m的低阈值场和高的发射电流密度,即3.5 A / cm / sup 2 /。 。提出了高纵横比和导线的高密度应该是考虑到优异的发射特性的主要优点。这些发现表明,垂直取向的SiNW在冷阴极应用中具有潜力。

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