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High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation

机译：氢等离子体刻蚀石墨纳米结构的高密度电子发射及其在高强度脉冲X射线产生中的应用

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摘要

High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation were investigated. We introduce a new nanometer-sized tailored cathode that can be made by simple etching of nano-craters onto a graphite substrate.

机译：研究了氢等离子体刻蚀制备的石墨纳米结构的高密度电子发射及其在高强度脉冲X射线产生中的应用。我们介绍了一种新的纳米尺寸定制阴极，可以通过将纳米凹坑简单蚀刻到石墨基板上来制成。

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《》|2003年|p.192|共1页
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Matsumoto; T.; Mimura; H.;
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中图分类无线电电子学、电信技术;
关键词
graphite; nanostructured materials; cathodes; electron field emission; sputter etching; X-ray production; radiography; high density electron emission; graphite nanostructure; hydrogen plasma etching; high intensity pulse X-ray generation; nanometer-sized;

机译：石墨;纳米结构材料;阴极;电子场发射;溅射蚀刻; X射线产生;射线照相;高密度电子发射;石墨纳米结构;氢等离子体蚀刻;高强度脉冲X射线产生;纳米级;

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2. Generation of very low energy-spread electron beams using low-intensity laser pulses in a low-density plasma [J] . Upadhyay A.K., Samant S.A., Sarkar D., Physics of plasmas . 2011,第3期

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3. A novel method to determine the electron temperature and density from the absolute intensity of line and continuum emission: application to atmospheric microwave induced Ar plasmas [J] . E Iordanova, J M Palomares, A Gamero, Journal of Physics, D. Applied Physics: A Europhysics Journal . 2009,第15期

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4. High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation [C] . Matsumoto T., Mimura H. International Microprocesses and Nanotechnology Conference . 2003

机译：通过氢等离子体蚀刻制造的石墨纳米结构的高密度电子发射及其在高强度脉冲X射线生成中的应用
5. The study of hard x-ray emission and electron beam generation in wire array Z-pinch and X-pinch plasmas at university-scale generators [D] . Shrestha, Ishor Kumar 2010

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High density electron emission from graphite nano-structure fabricated by hydrogen plasma etching and its application to high intensity pulse X-ray generation

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