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Effects of improved microchannel structures to the separation characteristics of microchip capillary electrophoresis

机译:改进的微通道结构对微芯片毛细管电泳分离特性的影响

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Microchip electrophoresis (MCE) offers fast and high resolution separation analyses, which have been applied to many fields, particularly in chemical and biological analysis. Many devices for MCE, however, were fabricated with glass and quartz by chemical etching, the fabrication flexibility is restricted because of its isotropically etching property. Moreover, glass fabrication process requires many steps and costs expensive. To overcome these problems, polymers are employed as base materials of microchip and prototyping process using synchrotron radiation (SR) were demonstrated. We have alreadv made a poly-dimethylsilozane (PDMS) microchip by UV lithography. But UV lithography brings the ambiguity of the cross sectional channel structures due to the diffraction effects of incident lights. It seems to change the properties of the channel walls for PDMS chips and causes band broadening of separation. In order to define the channel structure accurately and to investigate its effects to the separation characteristics, we used SR lithography process with thick epoxy negative resist (SU8). The SR has many advantages for the micro fabrication because of its high energy, collimated beam and less diffraction at the microchip channel size region. We used SU-8 as the thick UV/SR resist for the mold of PDMS thermal polymerization.
机译:微芯片电泳(MCE)提供了快速,高分辨率的分离分析,已应用于许多领域,尤其是化学和生物学分析。然而,许多用于MCE的器件是通过化学蚀刻用玻璃和石英制成的,由于其各向同性的蚀刻特性,制造灵活性受到限制。而且,玻璃制造过程需要许多步骤并且成本昂贵。为了克服这些问题,聚合物被用作微芯片的基础材料,并证明了使用同步加速器辐射(SR)进行原型制作的过程。我们已经通过紫外光刻技术制造了聚二甲基硅氧烷(PDMS)微芯片。但是由于入射光的衍射效应,UV光刻技术带来了横截面通道结构的歧义。似乎改变了PDMS芯片通道壁的特性,并导致分离的谱带变宽。为了准确定义通道结构并研究其对分离特性的影响,我们使用了带有厚环氧负性抗蚀剂(SU8)的SR光刻工艺。 SR由于具有高能量,准直光束和在微芯片通道尺寸区域的较少衍射,因此具有微加工的许多优势。我们将SU-8用作PDMS热聚合模具的厚UV / SR抗蚀剂。

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