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Development of high current surface ionization sources for heavy ion fusion

机译:开发用于重离子融合的高电流表面电离源

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Due to their intrinsic low ion temperature, surface ionization sources with a moderate to high current density (J/spl sim/10-100 mA/cm/sup 2/) may meet the beam brightness requirement for Heavy Ion Fusion (HIF) injectors, for both, the large source and multiple-beamlet designs. However, alkali metals released by these sources can contaminate and degrade high voltage insulators, thus making neutral atom loss an important issue. We present experimental results of average emitted J's and lifetime performance of K/sup +/ and Cs/sup +/ surface ionization sources and K-aluminosilicate sources operating in pulsed modes (2-10 /spl mu/s). Fabrication of large (/spl sim/10 cm diameter) aluminosilicate sources is challenging given the surface quality required. Current work in this aspect is presented.
机译:由于其固有的低离子温度,中等至高电流密度(J / spl sim / 10-100 mA / cm / sup 2 /)的表面电离源可能满足重型离子聚变(HIF)注射器的束亮度要求,既适用于大型光源,也适用于多光束设计。但是,这些来源释放的碱金属会污染高压绝缘子并使其退化,从而使中性原子损失成为重要问题。我们介绍了平均发射J值和K / sup + /和Cs / sup + /以脉冲模式(2-10 / spl mu / s)运行的表面电离源和K-铝硅酸盐源的寿命性能的实验结果。考虑到所需的表面质量,制造大型(/ spl sim / 10厘米直径)铝硅酸盐源具有挑战性。介绍了这方面的当前工作。

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