Highly transparent arcproof films for space applications

机译：用于太空应用的高透明防电弧膜

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Highly transparent films with tailorable sheet resistivity were prepared by ion-beam sputtering of indium tin oxide (ITO) with MgF_2 or SiO_2 in the presence of high-purity air. Sheet resistivities of 10~3-10~(11) obms/square (#OMEGA# /square ) and visible transmittances as high as 92

机译：在高纯空气存在下，用MgF_2或SiO_2对铟锡氧化物（ITO）进行离子束溅射，制备出具有可调节的薄层电阻率的高透明薄膜。薄层电阻为10〜3-10〜（11）obms / square（＃OMEGA＃/ square），可见光透射率高达92

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《Materials in space-science, technology and exploration》|1998年|p.101-106|共6页
会议地点 Boston MA(US)
作者
A. J. Adorjan; C. Alexander; T. L. Blanchard; E. Bruckner; R. Ferrante; S. M. Gajdos; K. Mayer; A. M. Pal; P. A. Walters; P. D. Hambourger; J. A. Dever; S. Rutledge;
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正文语种 eng
中图分类航空;
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4. Highly transparent arcproof films for space applications [C] . A. J. Adorjan, C. Alexander, T. L. Blanchard, Symposium on materials in space-science, technology and exploration . 1999

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Highly transparent arcproof films for space applications

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