XRD Stress Analysis of Nano-diamond Coatings on WC-Co Substrates

摘要

Residual stresses in diamond coatings grown on WC-Co substrate have been investigated byrnX-ray diffraction (XRD) method. Nano-diamond coatings were deposited by microwavernplasma-enhanced chemical vapor deposition technique (MP-CVD). To measure residual stress,rnwe tried different peak selection and instrument setting mode (χ mode and ω mode). For gettingrnreliable residual stress value, sin2ψ-method with omega-tilting mode (χ=0) was employed. Thern(311) plane of CVD diamond was used with tilting angle (ψ) from -40 to 40 degrees. Arncompressive stress of 1.65GPa was obtained by linear fitting the mean d-spacing values ofrnpositive and negative tilting. The occurrence of “ψ-splitting” demonstrates the existence ofrnnon-zero shear stress normal to the surface.