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Simulated Annealing Algorithm and Genetic Algorithm for Optimization Design of Multilayer Optical Thin-Film Coatings

机译:模拟退火算法和遗传算法在多层光学薄膜涂层优化设计中的应用

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The key parameters for Simulated Annealing Algorithm (SAA) and Genetic Algorithm (GA) were determined by test experiments. With optimal parameters obtained for both algorithms, the multilayer antireflection coatings in the 7.7-12.3μm band and a neutral beam splitter in the visible region were designed. Results showed that, for infrared multilayer antireflection coatings, the evaluation function value of SAA was 18.7% lower than that of GA, and the average transmittance of SAA was 0.4% higher than that of GA. Compared to GA, SAA achieved a higher average transmittance and a more flat transmittance curve. And for the neutral beam splitter, the running time of GA was 0.407s less than that of SAA, whereas the convergence effect of SAA was superior to that of GA. Therefore, the design with SAA has certain advantages for both the infrared multilayer antireflection coating and the beam splitter.
机译:通过测试实验确定了模拟退火算法(SAA)和遗传算法(GA)的关键参数。利用针对这两种算法获得的最佳参数,设计了7.7-12.3μm波段的多层抗反射涂层和可见光区域的中性分束器。结果表明,对于红外多层增透膜,SAA的评价函数值比GA低18.7%,平均透射率比GA高0.4%。与GA相比,SAA的平均透射率更高,透射率曲线更平坦。对于中性分束器,GA的运行时间比SAA的运行时间短0.407s,而SAA的收敛效果优于GA。因此,对于红外多层抗反射涂层和分束器,具有SAA的设计均具有某些优点。

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