首页> 外文会议>Long term prediction amp; modelling of corrosion >Simultaneous EIS and in situ microscope observationApplication to the scale electrodeposition
【24h】

Simultaneous EIS and in situ microscope observationApplication to the scale electrodeposition

机译:同时进行EIS和原位显微镜观察在鳞片电沉积中的应用

获取原文
获取原文并翻译 | 示例

摘要

A new experimental device was presented to investigate the in situ scalernelectrodeposition through a transparent quartz crystal microbalance (QCM). A microscopernlens was set behind the transparent working electrode leading a 400 × 300 μm field of view tornbe observed from a 5 mm in diameter electrode. A potential corresponding to the current ofrnoxygen reduction was applied allowing the interfacial pH between the solution and thernelectrode surface to be increased. The pH enhancement promoted the scale deposition from arncarbonically pure water. The QCM led the current of oxygen reduction and the mass of thernelectrodeposit to be measured versus time. The original transparent electrode allowed thernCaCO3 vaterite and calcite crystal growth to be observed versus time. The image processingrnsoftware allowed the nuclei to be counted over time from 1 μm minimum size. As the kineticrnof coverage was perfectly defined, the electrochemical impedance and the microscopernobservation through the transparent electrode were measured simultaneously versus time.
机译:提出了一种新的实验装置,以研究通过透明石英晶体微量天平(QCM)进行原位水垢电沉积。在透明工作电极的后面放置一个显微镜透镜,从直径为5 mm的电极上观察到400×300μm的视野。施加对应于当前的氧还原电流的电势,以使溶液和电极表面之间的界面pH升高。 pH值的提高促进了无碳纯水的水垢沉积。 QCM随时间测量了氧还原电流和电解沉积质量。原始的透明电极可以观察到CaCa3球ate石和方解石晶体随时间的增长。图像处理软件允许从1μm最小尺寸开始随时间对原子核进行计数。由于动力学覆盖范围得到了完美定义,因此可以同时测量电化学阻抗和通过透明电极的显微镜观察随时间的变化。

著录项

  • 来源
  • 会议地点 Nice(FR)
  • 作者单位

    Laboratoire Interfaces et Systèmes ElectrochimiquesrnLISE - UPR15 - CNRSrnUniversité Pierre et Marie Curie – case 133rn4 Place Jussieu, 75252 Paris cedex 5, FrancernE- mail: odevos@ccr.jussieu.fr;

    Laboratoire Interfaces et Systèmes ElectrochimiquesrnLISE - UPR15 - CNRSrnUniversité Pierre et Marie Curie – case 133rn4 Place Jussieu, 75252 Paris cedex 5, France;

    Laboratoire Interfaces et Systèmes ElectrochimiquesrnLISE - UPR15 - CNRSrnUniversité Pierre et Marie Curie – case 133rn4 Place Jussieu, 75252 Paris cedex 5, France;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Scale deposition; nucleation-growth; EIS; insulating; coverage;

    机译:结垢;成核生长EIS;绝缘覆盖范围;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号