Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters

摘要

The good optical properties of PQ (phenanthrenequinone)-doped PMMA (poly methylmethacrylate) and its flexibility to fabricate different substrate configurations make this material attractive for holographic recording. In previous work, filters in PQ/PMMA for Wavelength Division Multiplexing (WDM) and Optical Code Division Multiple Access (OCDMA) were demonstrated and shown to have a 0.03nm/℃ thermal tuning range operating near 1550nm. In this paper we investigate the effect of adding silicon dioxide nanoparticles to PQ/PMMA in order to measure the thermal tuning range and investigate the performance of these filters.