Recent Development in Nanoimprintinq Technique and its New Applications

摘要

1. Reversal imprinting allows patterning at low T (1) Polymer is first spin-coated on the mold and then transferred to the substrate 2. Three distinct pattern transfer modes depending on temperature and planarization (1) Reliable pattern transfer can occur at significantly lower temp and pressure than conventional NIL 3. Patterning over flexible and non-flat substrates (1) Thin film polymer substrate (2) Pre-patterned substrate (3) Multilayer 3-D printing.