Dye Sensitized Solar Cells using Titanium Oxide Photo Voltaic DevicesFabricated by Different Thermal Plasma Processes

摘要

Since Dye sensitized solar cell (DSC) is a solar cell whichrnuses anatase film as photo voltaic device, production cost ofrnDSC can be very low in comparison with that of silicon solarrncell. Besides, according to some theoretical discussion onrnDSC, the electric power conversion efficiency can be raised torn30%. Therefore, DSC will be mainly used in future. In thisrnstudy, in order to develop a low cost fabrication process forrnphoto voltaic device of DSC, photo-catalytic titanium oxidernfilm depositions were carried out by thermal plasma CVDrn(TPCVD) and thermal spraying. As working gas for plasma jet,rnand substrate, Ar gas and 20mm×40mm×1mm copper platernwere used. Feedstock materials were titanium tetra butoxide inrnTPCVD and rutile powder in thermal spraying. In the DSCsrnusing these films, cathodes (titanium oxide coated electrodes)rnwere located beneath the transparent anodes. Consequently, inrnthe case of TPCVD, anatase dominant film could be depositedrnand the DSC using this TPCVD film could generate 50 mV inrnelectro motive force. Furthermore, even in case of thermalrnspraying, though rutile powder was used, photo-catalyticrncoating (anatase and rutile mixture coating) could be obtainedrnby cooling substrate during coating and post heat treatment. Itrnwas confirmed that the electromotive force of the DSC usingrnthis thermal spray coating was almost the same as that of thernDSC using the TPCVD film. From these results, these thermalrnplasma processes was found to have high potential for DSCrnfabrication.