首页> 外文会议>International Symposium on Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers; 20050627-0701; Paris(FR) >Formation and growth processes of electrochemical passive layers (borate medium: pH 9.2) and electron stimulated oxidized films (5.10~(-6) Pa O_2) formed on Fe-Cr alloys
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Formation and growth processes of electrochemical passive layers (borate medium: pH 9.2) and electron stimulated oxidized films (5.10~(-6) Pa O_2) formed on Fe-Cr alloys

机译:在Fe-Cr合金上形成的电化学钝化层(硼酸介质:pH 9.2)和电子激发的氧化膜(5.10〜(-6)Pa O_2)的形成和生长过程

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摘要

Internal composition of passive layers (borate buffer pH 9.2, 0.3V/_(sce)) and Electron Stimulated Oxidized (ESO) layers formed on a series of Fe-Cr alloys (5 - 30 at%) was determined during ageing by quantitative AES depth profiling to approach and compare their film growth processes. ESO films were "in-situ" prepared by high (AES) electron irradiation under low oxygen pressures. In both cases, the film growth process seems to result of an outward cations migration (Fe Cr) under electric field (Cabrera-Mott model). Slow down of growth kinetics occurs beyond a critical chromium bulk concentration of 10-15 at% and may be attributed to an improved efficiency of inner Cr_2O_3 layers acting like a diffusion barrier for the Fe cations transport.
机译:钝化层的内部组成(硼酸缓冲液pH 9.2,0.3V / _(sce))和在一系列Fe-Cr合金(5-30 at%)上形成的电子刺激氧化(ESO)层在时效过程中通过定量AES确定了深度剖析,以接近并比较其薄膜生长过程。 ESO薄膜是通过在低氧气压力下通过高(AES)电子辐射“原位”制备的。在这两种情况下,膜的生长过程似乎都是在电场(Cabrera-Mott模型)下阳离子向外迁移(Fe >> Cr)的结果。生长动力学的减慢发生在超过10-15 at%的临界铬体积浓度时,这可能归因于内部Cr_2O_3层的效率提高,起到了Fe阳离子传输的扩散阻挡层的作用。

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