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OXIDATION OF HASTELLOY C276

机译:HASTELLOY C276的氧化

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摘要

Oxidation of Hastelloy C276 was studied at 300-800℃ in atmospheres that ranged from 0.01 to 100% O_2. X-ray diffraction and scanning electron microscopy indicated formation of Cr_2O_3 scales. The oxidation kinetics were approximately parabolic, but, contrary to expectations, there was no clear trend of scale-growth kinetics vs. oxygen partial pressure. This anomalous response was attributed to an extrinsic effect from cation doping of the scale, with a possible contribution from the rough, as-rolled surface finish of most of the coupons that were tested. The scales that formed on polished surfaces at 500℃ were smooth and nanocrystalline; those that formed at 800℃ were dense and consisted of faceted grains with an average size of ≈0.5-1蘭.
机译:研究了哈氏合金C276在300-800℃,0.01至100%O_2范围内的氧化性能。 X射线衍射和扫描电子显微镜表明形成了Cr_2O_3水垢。氧化动力学近似于抛物线,但与预期相反,氧化皮增长动力学与氧分压之间没有明显的趋势。这种反常的响应归因于鳞片阳离子掺杂的外在影响,并且可能是由于大多数被测试试样的粗糙,轧制表面光洁度造成的。在500℃的抛光表面形成的氧化皮是光滑的纳米晶;在800℃时形成的那些是致密的,由多面晶粒组成,平均尺寸约为0.5-1兰。

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