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High-flux palladium-silver alloy membranes fabricated by microsystem technology

机译:微系统技术制备高通量钯银合金膜

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摘要

In this study, hydrogen selective membranes have been fabricated using microsystem technology. A 750 nm dense layer of Pd (77 wt%) and Ag (23 wt%) is deposited on a non-porous 1 mm thick silicon nitride layer by co-sputtering of a Pd and a Ag target. After sputtering, openings of 5 μm are made in the silicon nitride layer to create a clear passage to the Pd/Ag surface. As a result of the production method, these membranes are pinhole free and have a low resistance to mass transfer in the gas phase, as virtually no support layer is present. The membranes have been tested in a gas permeation system to determine the hydrogen permeability as a function of temperature, gas flow rate, and feed composition. In addition, the hydrogen selectivity over helium has been determined, which appears to be above 1500. At 0.2 bar partial hydrogen pressure in the feed, the hydrogen permeability of the membranes has been found to range from 0.02 to 0.95 mol.H_2/m~2xs at 350 and 450℃, respectively. It is expected that by improving the hydrodynamics and increasing the operation temperature, substantially higher fluxes will be attainable.
机译:在这项研究中,已经使用微系统技术制造了氢选择性膜。通过共溅射Pd和Ag靶,将750nm的Pd(77wt%)和Ag(23wt%)的致密层沉积在无孔的1mm厚的氮化硅层上。溅射后,在氮化硅层中形成5μm的开口,以形成通向Pd / Ag表面的通道。作为生产方法的结果,这些膜是无针孔的,并且在气相中对传质的阻力低,因为实际上不存在支撑层。已在气体渗透系统中对膜进行了测试,以确定氢渗透率与温度,气体流速和进料组成的关系。另外,已经确定了对氦的氢气选择性,该氢气选择性似乎高于1500。在进料中氢气分压为0.2 bar时,膜的氢气渗透率范围为0.02至0.95 mol.H_2 / m〜。在350和450℃分别为2xs。期望通过改善流体力学和增加操作温度,将可获得更高的通量。

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