Enhancement of the electrophotographic sensitivity of amorphous selenium films using a PVK polymer barrier layer

摘要

X-ray sensitivity of amorphous selenium (a-Se films approx 130 mu m) has been studied as a function of thickness (approx 2400A to 7500 A) of polyvinyl carbazole (PVK) interface barrier layer using the potential decay technique. The films show maximum sensitivity when incorporated with barrier layer of thickness approx 7500 A. This has been attributed to the blocking, trapping and field enhanced mobility role of the PVK interface barrier layer.