DEPENDENCE OF RESIDUAL STRESSES IN THIN FILMS ON STRESS-FREE LATTICE SPACING

摘要

Residual stresses in plasma enhanced vapor deposited TiN film and steel substrate were measured with an X-ray diffraction technique. It was found that the stress-free lattice spacing of both materials is a variable determined by the conventional ψ~* method, but only for the thin film a linear dependence exists of measured stress against the stress-free lattice spacing. This is attributed to an effect of microstrains which may become pronounced for the film with a nano-crystallized structure and a thickness less than X-ray penetration depth.