Fabrication of Sputtered TiO_(2-x)N_x Photocatalyst Using Spark Plasma Sintered Targets

摘要

We tried to make nano-sized TiN_x powders by using planetary milling and consolidate to make targets for sputter by using spark plasma sintering apparatus. After getting aimed target, we coated films with several kinds of surface with various gas mixtures in order to make TiO_(2-x)N_x layer on them. The crystal structure of TiN_x was analyzed by X-ray diffraction. The size of TiN_x was determined with particle size analyzer and microstructure was analyzed by FESEM. With increasing N_2 concentration in mixture gas, the color of the thin film on the substrate change of from near transparency to dull, that is, from yellow to dark yellow. In the case of increasing RF powder from 300W to 400W, the nitrogen concentration in this layer is increased. Nano-sized TiN_x of about 30-40nm was obtained from commercial titanium powder by planetary milling. We can make films by RF magnetron sputter using our nano-sized TiN_x powder. Sputtering on silicon wafer(100) and SUS304 with TiN_x target, and control its "x" index which is main parameter to get TiO_(2-x)N_x. Using XPS method we can conclude that the Binding Energy value that of N 1s peak of TiO_(2-x)N_x was almost same as that of other researchers.