Dynamic exposure model analysis of continuous laser direct writing in Polar-coordinate

摘要

In order to exactly predict the continuous laser direct writing quality in Polar-coordinate, we take into consideration the effect of the photoresist absorbing beam energy, the Gaussian attribute of the writing beam and the dynamic exposure process, and establish a dynamic exposure model to describe the influence of the tangential velocity of the normal incident facular center and laser power on the line width and sidewall angle. Numerical simulation results indicate that while writing velocity remains unchanged, the line width and sidewall angle are all increased as the laser power increases; while laser power remains unchanged, the line width and sidewall angle are all decreased as the writing velocity increases; at the same time the line profile in the exposure section is asymmetry and the center of the line has tiny excursion toward the Polar-coordinate origin compared with the facular center. Then it is necessary to choose the right writing velocity and laser power to obtain the ideal line profile. The model makes up the shortcomings of traditional models that can only predict line width or estimate the profile of the writing line in the absence of photoresist absorption, and can be considered as an effect analysis method for optimizing the parameters of fabrication technique of laser direct writing.