Hydrogen permeation behavior in polycrystalline nickel implanted with various elements

摘要

The entry and transport of hydrogen in polycrystalline nickel implanted with various elements (He, Ar, B, P, S, Bi, Ni, Y, Pt, As, Pb and Sb) has been investigated in a fluence range of 1 × 10~(14) to 2 × 10~(17) ions/cm~2 using an electrochemical permeation technique and etching technique, where the elements used are categorized as follows: inert elements (He and Ar), the substrate element (Ni), metalloids (P, S, Sb and As), a catalytic element (Pt) and the other elements (Pb, Bi, Y and B). It was found that the effective diffusion coefficient of hydrogen and the effective solubility were largely dependent upon fluence and elements in comparison to those obtained from non-implanted nickel. The results obtained were qualitatively explained in terms of gas bubbles and defects generated by implantation, compressive stress, catalytic effect, the formation of amorphous phase and so on.