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Electronic band structure of strained C- and M-plane GaNfilms investigated by polarized photoreflectance spectroscopy

机译:偏振光反射光谱法研究应变C和M面GaN薄膜的电子能带结构

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We investigate the band structure of a strained C-plane GaN(0001) film on 6H-SiC(0001) and a strained M-plane GaN(ll00) film on γ-LiAlO2(100) experimentally by polarized photoreflectance (PPR) spectroscopy and theoretically using the k·p model. Applying the Bir-Pikus Hamiltonian, we calculate the energy and the oscillator strength components of the three transitions at the band gap of GaN as a function of an arbitrary strain in the C plane and the M plane. These theoretical studies predict a strain-dependent change in the valence band structure for compressively strained M-plane GaN films resulting in a large in-plane polarization anisotropy in comparison to unstrained or compressively strained C-plane GaN films, which is experimentally confirmed by the PPR spectra of the corresponding films. Therefore, it may be possible with M-plane GaN to achieve a lower transparency density in lasers and to naturally fix the polarization direction in surface-emitting lasers.
机译:我们通过偏振光反射(PPR)光谱研究了6H-SiC(0001)上的应变C面GaN(0001)膜和γ-LiAlO2(100)上的应变M面GaN(1100)膜的能带结构,理论上使用k·p模型。应用Bir-Pikus哈密顿量,我们计算了GaN带隙处三个跃迁的能量和振子强度分量,它们是C平面和M平面中任意应变的函数。这些理论研究预测,与未应变或压缩应变的C平面GaN膜相比,压应变的M平面GaN膜的价带结构将发生应变相关变化,从而导致面内极化各向异性较大。相应膜的PPR光谱。因此,使用M面GaN可以在激光器中实现较低的透明密度,并自然固定在表面发射激光器中的偏振方向。

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