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Metallic and insulating behaviour in p-SiGe at v =3/2

机译:v = 3/2时p-SiGe中的金属和绝缘行为

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Shubnikov-de Haas data is presented for a p-SiGe sample exhibiting strongly insulating behaviour at v= 3/2. In addition to the fixed points defining a high field metal- insulator transition into this phase separate fixed points can also be identified for the v = 3→2 and 2→ 1 Integer quantum Hall transitions. Another feature of the data, that the Hall resistivity approaches zero in the insulating phase, indicates it is not a re-entrant Hall insulator. The behaviour is explained in terms of the strong exchange interactions. At integer filling factors these cause the 0 ↑ and 1 ↓, Landau levels to cross and are well separated but at non-integer values of v screening reduces exchange effects and causes the levels to stick together. It is suggested the insulating behaviour, and high field metal/insulator transition, is a consequence of the strong exchange interactions.
机译:Shubnikov-de Haas数据针对的是在v = 3/2时表现出强绝缘行为的p-SiGe样品。除了定义到该相的高场金属-绝缘体过渡的固定点之外,还可以为v = 3→2和2→1整数量子霍尔过渡确定单独的固定点。数据的另一个特征是,霍尔电阻率在绝缘阶段接近零,表明它不是可重入的霍尔绝缘子。该行为是根据强大的交换交互作用来解释的。在整数填充因子下,这些会导致0↑和1↓,Landau的水平交叉并很好地分开,但是在v筛选的非整数值下会减少交换效果并导致这些水平粘在一起。建议绝缘行为和高场金属/绝缘体转变是强交换相互作用的结果。

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