首页> 外文会议>Instrumentation Science and Technology Vol.1 >Double Beam Laser Interferometer to Measure Piezoelectric Displacements for Elimination of Substrate Effect in Thin Films
【24h】

Double Beam Laser Interferometer to Measure Piezoelectric Displacements for Elimination of Substrate Effect in Thin Films

机译:双光束激光干涉仪测量压电位移,以消除薄膜中的基板效应

获取原文

摘要

Using a feedback loop of anti- interference to stabilize optical path length difference the interferometer is operated in the most sensitive operation point. So the measurable minimum displacement of piezoelectric thin films induced by electric filed is 0.3 pm. The interferometer also can be used to measure butterfly curves of ferroelectric thin film, because by using lock-in amplifier, the complex piezoelectric response can be measured. The operating frequency bandwidth of the interferometer is from 1 kHz to 102 kHZ. All measurements by the interferometer are automatically completed because the whole measuring process including the date acquisition and the results displaying is controlled by personal computer communicating with the lock-in amplifier via RS232 interface.
机译:使用抗干扰的反馈回路来稳定光程长度差,干涉仪将在最敏感的工作点工作。因此,电场引起的压电薄膜的最小可测位移为0.3 pm。干涉仪还可以用于测量铁电薄膜的蝶形曲线,因为通过使用锁定放大器,可以测量复杂的压电响应。干涉仪的工作频率带宽为1 kHz至102 kHZ。干涉仪的所有测量都是自动完成的,因为包括日期采集和结果显示在内的整个测量过程均由个人计算机通过RS232接口与锁定放大器进行通讯控制。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号