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Plasmonic Design Based Structures For THz Antenna Sources and Detectors

机译:基于等离子设计的太赫兹天线源和探测器结构

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We review here our efforts to make high power THz sources. We have developed different plasmonic structural designs for the confinement of incident excitation infra-red (800nm, 10fs) laser pulse on SI-GaAs surface. The SI-GaAs surface is modified so that incident radiation is less reflected and more absorbed in the substrate. Fabricating THz antenna structures on it increases the efficiency of the THz source. We have demonstrated this idea in its simplest form by increasing the overall surface area by fabricating trenches on the GaAs surface in the past. The new designs are expected to increase the THz source emission by at least a factor 2 to 4. We have also fabricated quasi-crystal pattern on SI-GaAs substrate to enhance the incident light confinement and checked THz emission from it. The simulated plasmonic structures will be fabricated on the SI-GaAs substrates as well as C-irradiated GaAs substrates. We have shown that our in-house fabricated THz Sources from C-irradiated SI-GaAs showed ~2 orders power increase. The detectors fabricated from these materials showed replica of the incident THz wave compared to the one detected using ZnTe. We will also present use of the C-irradiated substrates in the generation of Continuous Wave (CW) THz sources. All the aforementioned sources have been compared with the commercially available sources made of LT-GaAs.
机译:我们在这里回顾我们制造高功率太赫兹源的努力。我们已经开发出各种等离激元结构设计,以限制SI-GaAs表面上的入射激发红外(800nm,10fs)激光脉冲。修改了SI-GaAs表面,以使入射辐射在基板中的反射少且吸收更多。在其上制造THz天线结构可提高THz源的效率。过去,我们通过在GaAs表面上制造沟槽来增加总表面积,从而以最简单的形式展示了该想法。新设计有望使THz源发射至少增加2到4倍。我们还在SI-GaAs衬底上制造了准晶体图案,以增强入射光限制并检查了它的THz发射。模拟的等离激元结构将在SI-GaAs衬底以及C辐照的GaAs衬底上制造。我们已经表明,由C辐照的SI-GaAs制成的内部THz光源显示功率增加了约2个数量级。用这些材料制成的探测器与使用ZnTe探测到的相比,显示出入射太赫兹波的复制品。我们还将介绍在连续波(CW)太赫兹源的产生中使用C辐射的基板。已将所有上述来源与由LT-GaAs制成的市售来源进行了比较。

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