Fraunhofer Institute for Solid State Technology Hansastr. 27d, 80 686 Munich;
Department of Electrical and Computer Engineering Carnegie Mellon University, Pittsburgh;
aiss GmbH, Gotzingerstr. 46, 81 371 Munich;
Department of Electrical and Computer Engineering Carnegie Mellon University, Pittsburgh;
Fraunhofer Institute for Solid State Technology Hansastr. 27d, 80 686 Munich;
Siemens AG, Corporate Research and Development Otto-Hahn-Ring 6 , 81 730 Munich;
Siemens AG, Corporate Research and Development Otto-Hahn-Ring 6 , 81 730 Munich;
机译:圆形刀具库和ATC的失效模式影响和临界分析(FMECA)
机译:通过临界尺寸分布测量估算极紫外光刻中的随机缺陷可能性极低
机译:光刻参数化产量估算模型,可通过简化的光刻模拟集来预测布局图案变形
机译:AFFCCA:一种具有圆形缺陷和光刻变形布局的关键区域分析工具
机译:用于自然缺陷分析的极紫外光刻掩模版的局部掩模图案
机译:RadialPheno:通过径向布局进行近地表物候分析的工具
机译:光刻参数产量估计模型,用减少的光刻模拟集来预测布局图案失真
机译:压缩层合板中圆形脱粘缺陷的缺陷危险性。