Statistical Modeling of Dielectric metamaterial with Fabrication Imperfection Tolerance

摘要

Metamaterial and metasurface are promising tools for the design of new microwave and optical applications. For nanoscale meta-atoms, the fabrications tolerance includes surface roughness, size variations, and slight sidewall tapering will affect the experiment performance from the simulation results in commercial software. In this work, we will propose a statistical modeling framework for the modeling of dielectric metamaterial with fabrication tolerance. Only several sampling evaluations of metamaterial with fabrication tolerance parameters to achieve the statistical performance as evaluated by standard Monte-Carlo method with thousands repeated simulations. The proposed statistical synthesis method will pave a way for future metamaterial device designs with imperfect fabrications.