Investigations of the behavior for PQ-PMMA material post-exposure

摘要

Phenanthreneauinone (PQ) doped poly(methyl methacrylate) (PMMA) photopoplymer material has been actively investigated in the literature. Based on the previously developed NPDD model and the analysis of the mechanisms, the behavior of the material is being further studied. The first harmonic refractive index modulation has been examined for both long time post-exposure and under thermal treatment. Twelve and four spatial concentration harmonics in the Fourier series expansions are applied respectively for comparison. Several effects, i.e., the non-local effect, the diffusion of both the ground state and excited states PQ molecules, which occur during and post-exposure in PQ-PMMA photopolymer materials, have been studied under thermal treatment. For long time post-exposure or when the heating treatment is applied, the formation of the photoproduct, PQ/PMMA, has become very important. The effects of non-locality, diffusion and the different exposing intensities on the distribution of PQ/PMMA over space and higher harmonic PQ/PMMA concentration have been shown. The experimental results are presented, where no thermal treatment is applied.