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Cathodoluminescence spectroscopy on selectively grown GaN nanowires

机译:选择性生长的GaN纳米线上的阴极发光光谱

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摘要

GaN nanowires (NWs) were grown selectively on Si(lll) substrate without catalyst by plasma-assisted molecular-beam epitaxy under N-rich conditions. The selective growth was obtained using regular arrays of holes patterned in a silicon oxide layer on top of a thin A1N buffer. The optical properties of the selectively grown GaN NWs have been studied using cathodoluminescence (CL) spectroscopy. Both, CL spectra measured on NW ensembles and spatially resolved monochromatic images were investigated. From a comparison of morphology and CL studies it emerges that NW coalescence is responsible for the appearance of the defect related emission.
机译:在富氮条件下,通过等离子体辅助分子束外延,在没有催化剂的情况下,在Si(III)衬底上选择性生长GaN纳米线(NWs)。使用在薄AlN缓冲液顶部的氧化硅层中构图的规则的孔阵列来获得选择性生长。选择性生长的GaN NW的光学性质已使用阴极发光(CL)光谱进行了研究。研究了在NW集合和空间分辨单色图像上测得的CL光谱。从形态学和CL研究的比较可以看出,NW聚结是与缺陷有关的发射的出现的原因。

著录项

  • 来源
    《Gallium nitride materials and devices VI》|2011年|p.793903.1-793903.9|共9页
  • 会议地点 San Francisco CA(US)
  • 作者单位

    Institute of Bio- and Nanosystems (IBN-1) and JARA- Fundamentals of Future Information Technology, Research Centre Julich GmbH, D-52425 Julich, Germany,Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany;

    Institute of Bio- and Nanosystems (IBN-1) and JARA- Fundamentals of Future Information Technology, Research Centre Julich GmbH, D-52425 Julich, Germany,Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany;

    Institute of Bio- and Nanosystems (IBN-1) and JARA- Fundamentals of Future Information Technology, Research Centre Julich GmbH, D-52425 Julich, Germany,Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany;

    Institute of Bio- and Nanosystems (IBN-1) and JARA- Fundamentals of Future Information Technology, Research Centre Julich GmbH, D-52425 Julich, Germany;

    Institute of Bio- and Nanosystems (IBN-1) and JARA- Fundamentals of Future Information Technology, Research Centre Julich GmbH, D-52425 Julich, Germany,Paul-Drude-Institut fur Festkorperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
  • 关键词

    GaN; nanowires; MBE; SAG; CL;

    机译:氮化镓;纳米线; MBE;凹陷CL;

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